Atomic layer deposition of titanium dioxide on silicon and gallium arsenate substrates using tetrakis-dimethylamido titanium and water precursors.
by John W Lacis
| Publisher: | Unknows |
| Published In: | 11-May-2012 |
| ISBN-10: | 1248976606 |
| ISBN-13: | 9781248976609 |
| Binding Type: | Paperback |
| Weight: | 231 gms |
| Pages: | pp. 86 |
The Title "Atomic layer deposition of titanium dioxide on silicon and gallium arsenate substrates using tetrakis-dimethylamido titanium and water precursors." is written by John W Lacis. This book was published in the year 1120. The ISBN number 1248976606|9781248976609 is assigned to the Paperback version of this title. This book has total of pp. 86 (Pages). The publisher of this title is Unknows. Atomic layer deposition of titanium dioxide on silicon and gallium arsenate substrates using tetrakis-dimethylamido titanium and water precursors. is currently Not Available with us.You can enquire about this book and we will let you know the availability.