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Multiscale approaches for simulation of nucleation, growth, and additive chemistry during electrochemical deposition of thin metal films.

by  Ryan Mark Stephens
Multiscale approaches for simulation of nucleation, growth, and additive chemistry during electrochemical deposition of thin metal films.,1243553243,9781243553249

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Book Information

Publisher:Unknows
Published In:03-Sep-2011
ISBN-10:1243553243
ISBN-13:9781243553249
Binding Type:Paperback
Weight:504 gms
Pages:pp. 244, 50:B&W 7.44 x 9.69 in or 246 x 189 mm (Crown 4vo) Perfect Bound on White w/Gloss

The Title "Multiscale approaches for simulation of nucleation, growth, and additive chemistry during electrochemical deposition of thin metal films." is written by Ryan Mark Stephens. This book was published in the year 0320. The ISBN number 1243553243|9781243553249 is assigned to the Paperback version of this title. This book has total of pp. 244 (Pages). The publisher of this title is Unknows. Multiscale approaches for simulation of nucleation, growth, and additive chemistry during electrochemical deposition of thin metal films. is currently Not Available with us.You can enquire about this book and we will let you know the availability.